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Vikrant Agnihotri

age ~41

from Jersey City, NJ

Vikrant Agnihotri Phones & Addresses

  • Jersey City, NJ
  • Cambridge, MA
  • 20 2Nd St APT 308, Jersey City, NJ 07302

Industries

Nanotechnology

Us Patents

  • Patterning Of Nanostructures

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  • US Patent:
    8093144, Jan 10, 2012
  • Filed:
    May 23, 2003
  • Appl. No.:
    10/444176
  • Inventors:
    Joseph M. Jacobson - Newton MA,
    David Kong - Lexington MA,
    Vikas Anant - Cambridge MA,
    Ashley Salomon - Chicago IL,
    Saul Griffith - Cambridge MA,
    Will DelHagen - Cambridge MA,
    Vikrant Agnihotri - Cambridge MA,
  • Assignee:
    Massachusetts Institute of Technology - Cambridge MA
  • International Classification:
    H01L 21/20
  • US Classification:
    438509, 438478, 438507, 438795, 257E2116, 257E21324, 257E21497
  • Abstract:
    A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.
  • Rapid Patterning Of Nanostructures

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  • US Patent:
    8367525, Feb 5, 2013
  • Filed:
    Jan 23, 2010
  • Appl. No.:
    12/692610
  • Inventors:
    Joseph M. Jacobson - Newton MA,
    Jon Varsanik - Allston MA,
    Vikrant Agnihotri - Jersey City NJ,
  • Assignee:
    Massachusetts Institute of Technology - Cambridge MA
  • International Classification:
    H01L 21/20
    H01L 21/31
  • US Classification:
    438478, 438758, 438962
  • Abstract:
    A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.
  • Rapid Patterning Of Nanostructures

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  • US Patent:
    20070197044, Aug 23, 2007
  • Filed:
    Jan 12, 2006
  • Appl. No.:
    11/330865
  • Inventors:
    Joseph Jacobson - Newton MA,
    Jon Varsanik - Allston MA,
    Vikrant Agnihotri - Jersey City NJ,
  • International Classification:
    H01L 21/428
  • US Classification:
    438758000, 977890000, 977901000
  • Abstract:
    A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system in a vacuum chamber and introduction of the charged nanoparticles to a region proximate to a charge pattern, so that the particles adhere to the charge pattern in order to form the feature. Two- or three-dimensional nanostructures may be formed by rapidly creating a charge pattern of nanoscale dimensions on a substrate using a normal electron beam or a microcolumn electron beam, generating high purity nanoscale or molecular size scale building blocks of a first type that image the charge pattern using the electrospray system, and then optionally sintering the building blocks to form the feature.
  • Patterning Of Nanostructures

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  • US Patent:
    20120108041, May 3, 2012
  • Filed:
    Jan 10, 2012
  • Appl. No.:
    13/347662
  • Inventors:
    Joseph M. Jacobson - Newton MA,
    David Kong - Lexington MA,
    Vikas Anant - Cambridge MA,
    Ashley Salomon - Chicago IL,
    Saul Griffith - Cambridge MA,
    Will DelHagen - Cambridge MA,
    Vikrant Agnihotri - Cambridge MA,
  • Assignee:
    MASSACHUSETTS INSTITUTE OF TECHNOLOGY - Cambridge MA
  • International Classification:
    H01L 21/20
  • US Classification:
    438509, 438478, 257E2109
  • Abstract:
    A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.

Resumes

Vikrant Agnihotri Photo 1

Vikrant Agnihotri

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Location:
Greater Boston Area
Industry:
Nanotechnology

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Vikrant Agnihotri Photo 2

Vikrant Agnihotri

Work:
Indiafin Technologies Ltd. - Web Designer
Education:
B. Tech

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Vikrant Agnihotri Photo 3

Vikrant Agnihotri

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Vikrant Agnihotri Photo 4

Vikrant Agnihotri

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Vikrant Agnihotri Photo 5

Vikrant Agnihotri

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Vikrant Agnihotri Photo 6

Vikrant Kumar Agnihotri

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