Vikrant X Agnihotri

US Patent:

8093144, Jan 10, 2012

Filed:

May 23, 2003

Appl. No.:

10/444176

Inventors:

Joseph M. Jacobson - Newton MA, US
David Kong - Lexington MA, US
Vikas Anant - Cambridge MA, US
Ashley Salomon - Chicago IL, US
Saul Griffith - Cambridge MA, US
Will DelHagen - Cambridge MA, US
Vikrant Agnihotri - Cambridge MA, US

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

H01L 21/20

US Classification:

438509, 438478, 438507, 438795, 257E2116, 257E21324, 257E21497

Abstract:

A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.

US Patent:

8367525, Feb 5, 2013

Filed:

Jan 23, 2010

Appl. No.:

12/692610

Inventors:

Joseph M. Jacobson - Newton MA, US
Jon Varsanik - Allston MA, US
Vikrant Agnihotri - Jersey City NJ, US

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

H01L 21/20
H01L 21/31

US Classification:

438478, 438758, 438962

Abstract:

A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.

US Patent:

20070197044, Aug 23, 2007

Filed:

Jan 12, 2006

Appl. No.:

11/330865

Inventors:

Joseph Jacobson - Newton MA, US
Jon Varsanik - Allston MA, US
Vikrant Agnihotri - Jersey City NJ, US

International Classification:

H01L 21/428

US Classification:

438758000, 977890000, 977901000

Abstract:

A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system in a vacuum chamber and introduction of the charged nanoparticles to a region proximate to a charge pattern, so that the particles adhere to the charge pattern in order to form the feature. Two- or three-dimensional nanostructures may be formed by rapidly creating a charge pattern of nanoscale dimensions on a substrate using a normal electron beam or a microcolumn electron beam, generating high purity nanoscale or molecular size scale building blocks of a first type that image the charge pattern using the electrospray system, and then optionally sintering the building blocks to form the feature.

US Patent:

20120108041, May 3, 2012

Filed:

Jan 10, 2012

Appl. No.:

13/347662

Inventors:

Joseph M. Jacobson - Newton MA, US
David Kong - Lexington MA, US
Vikas Anant - Cambridge MA, US
Ashley Salomon - Chicago IL, US
Saul Griffith - Cambridge MA, US
Will DelHagen - Cambridge MA, US
Vikrant Agnihotri - Cambridge MA, US

Assignee:

MASSACHUSETTS INSTITUTE OF TECHNOLOGY - Cambridge MA

International Classification:

H01L 21/20

US Classification:

438509, 438478, 257E2109

Abstract:

A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.

US Patent:

20160079060, Mar 17, 2016

Filed:

Jun 30, 2015

Appl. No.:

14/788723

Inventors:

Joseph M. Jacobson - Newton MA, US
David Kong - Lexington MA, US
Vikas Anant - Cambridge MA, US
Ashley Salomon - Chicago IL, US
Saul Griffith - Cambridge MA, US
Will DelHagen - Cambridge MA, US
Vikrant Agnihotri - Cambridge MA, US

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

H01L 21/02
H01L 21/285
H01L 21/263

Abstract:

A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.

US Patent:

20150132928, May 14, 2015

Filed:

Jan 20, 2015

Appl. No.:

14/600676

Inventors:

Joseph M. Jacobson - Newton MA, US
David Kong - Lexington MA, US
Vikas Anant - Cambridge MA, US
Ashley Salomon - Chicago IL, US
Saul Griffith - Cambridge MA, US
Will DelHagen - Cambridge MA, US
Vikrant Agnihotri - Cambridge MA, US

Assignee:

MASSACHUSETTS INSTITUTE OF TECHNOLOGY - Cambridge MA

International Classification:

H01L 21/02
H01L 21/285

US Classification:

438509, 438661, 438778

Abstract:

A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.