Kon H Cho

US Patent:

52894720, Feb 22, 1994

Filed:

Feb 5, 1992

Appl. No.:

7/831601

Inventors:

Kon H. Cho - Holmdel NJ

Assignee:

AT&T Bell Laboratories - Murray Hill NJ

International Classification:

H04J 312
H04L 1266

US Classification:

3701101

Abstract:

A method is disclosed for transmitting information from a non-ISDN compatible communication device to an ISDN compatible receiving device via the D Channel of an Integrated Systems Digital Network. To facilitate this transmission, the information is reformatted, embedded in an ISDN signaling protocol message, and transmitted to an ISDN compatible recipient as Message Associated User-To-User Information.

US Patent:

39634892, Jun 15, 1976

Filed:

Apr 30, 1975

Appl. No.:

5/573506

Inventors:

Kon Ho Cho - West Windsor NJ

Assignee:

Western Electric Company, Inc. - New York NY

International Classification:

H01L 21312

US Classification:

96 27R

Abstract:

A method of precisely aligning a pattern on one side of an opaque substrate with a pattern on the opposite side thereof through the use of pattern-defining masks, wherein at least certain pattern areas previously not formed on the substrate, as defined selectively through the masks, are formed while the masks are aligned. The first mask is releasably secured to a first side of the substrate so as to define a particular orientation of a desired pattern therethrough, and is dimensioned such that at least one, but preferably several spaced peripheral areas thereof extend beyond adjacent peripheral edge portions of the wafer, with the extended mask areas including alignment indicia. A second mask is then positioned against a second side of the substrate, and is constructed with one or more outwardly extending peripheral areas and respectively associated alignment indicia corresponding in number, and spatial relationship, with those in the first mask. The second mask is then oriented such that the alignment indicia thereof are brought into precise registry with the corresponding alignment indicia of the first mask so as to ensure that the pattern-defining portions of the masks are in precise alignment on opposite sides of the substrate.