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Zuoqian X Wang

age ~37

from Santa Clara, CA

Also known as:
  • Zuoqian C Wang
  • Zuoqian Z Wang
  • Zuqian Wang

Zuoqian Wang Phones & Addresses

  • Santa Clara, CA
  • Fremont, CA
  • Dublin, CA
  • El Cerrito, CA
  • Berkeley, CA

Work

  • Company:
    Applied materials, akt
    Jun 2013
  • Position:
    R&d mechanical engineer

Education

  • School / High School:
    UC Berkeley
    2008
  • Specialities:
    Ph.D. in Mechanical Engineering (Minors: Electrical Engineering and Materials)

Skills

*Electrochemical Characterization: EIS • CV • Galvanic Charging/Discharging Techniques • Temperature and Humidity Environmental T... • Encapsulations Permeability Test ... • OM • AFM) • Profilometries • Tensiometry • XRD • DSC • Van Der Pauw Method • Thermal Conductivity Measurement ... • SolidWorks • CATIA • NX Unigraphics *Finite Eleme... • ADAMS • MATLAB • C *Languages: English (Fl... • Mandarin (Native) • Japanese (Basic)

Us Patents

  • Permanent Magnetic Chuck For Oled Mask Chucking

    view source
  • US Patent:
    20180075958, Mar 15, 2018
  • Filed:
    Nov 15, 2017
  • Appl. No.:
    15/814265
  • Inventors:
    - Santa Clara CA, US
    Zuoqian WANG - Dublin CA, US
  • International Classification:
    H01F 7/02
    G03F 7/20
  • Abstract:
    A permanent magnetic mask chuck is described herein. The permanent magnetic mask chuck includes a body with a plurality of permanent magnets positioned therein. The permanent magnets can then deliver a magnetic force to a mask to position and hold the mask over or on the substrate for further deposition.
  • Substrate Carrier With Integrated Electrostatic Chuck

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  • US Patent:
    20160211162, Jul 21, 2016
  • Filed:
    Sep 18, 2014
  • Appl. No.:
    14/916676
  • Inventors:
    - Santa Clara CA, US
    Zuoqian WANG - Dublin CA, US
  • International Classification:
    H01L 21/683
    C23C 16/458
    C23C 14/50
    H01L 21/677
  • Abstract:
    A substrate carrier adapted to use in a processing system includes an electrode assembly and a support base. The electrode assembly is configured to generate an electrostatic chucking force for securing a substrate to the substrate carrier. The support base has a heating/cooling reservoir formed therein. The electrode assembly and the support base form an unitary body configured for transport within a processing system. A quick disconnect is coupled to the body and configured to trap a heat regulating medium in the reservoir heating/cooling reservoir when the body is decoupled from a source of heat regulating medium.
  • Substrate Carrier With Integrated Electrostatic Chuck

    view source
  • US Patent:
    20160196997, Jul 7, 2016
  • Filed:
    Sep 18, 2014
  • Appl. No.:
    14/916019
  • Inventors:
    - Santa Clara CA, US
    Zuoqian WANG - Dublin CA, US
  • International Classification:
    H01L 21/683
    H01L 21/67
    H05B 3/03
    C23C 16/458
    F26B 3/00
    F27B 1/08
    H01L 21/673
    C23C 14/50
  • Abstract:
    A substrate carrier adapted to use in a processing system includes an electrode assembly and a support base. The electrode assembly is configured to generate an electrostatic chucking force for securing a substrate to the substrate carrier. The support base has a heating/cooling reservoir formed therein. The electrode assembly and the support base form an unitary body configured for transport within a processing system. A quick disconnect is coupled to the body and configured to trap a heat regulating medium in the reservoir heating/cooling reservoir when the body is decoupled from a source of heat regulating medium.
  • Electromagnetic Chuck For Oled Mask Chucking

    view source
  • US Patent:
    20150343580, Dec 3, 2015
  • Filed:
    Aug 19, 2014
  • Appl. No.:
    14/463254
  • Inventors:
    - Santa Clara CA, US
    Zuoqian WANG - Dublin CA, US
  • International Classification:
    B23Q 3/154
    C23C 14/24
    C23C 14/28
    H01L 21/683
  • Abstract:
    An electromagnetic mask chuck is described herein. The electromagnetic mask chuck includes a body with a plurality of electromagnets formed therein. The electromagnets can then deliver a magnetic force to a mask to position and hold the mask over or on the substrate for further deposition. The electromagnets are controlled using a power source, to deliver a controlled magnetic field to the mask.
  • Permanent Magnetic Chuck For Oled Mask Chucking

    view source
  • US Patent:
    20150348812, Dec 3, 2015
  • Filed:
    Aug 20, 2014
  • Appl. No.:
    14/463825
  • Inventors:
    - Santa Clara CA, US
    Zuoqian WANG - Dublin CA, US
  • International Classification:
    H01L 21/683
    H01F 7/02
  • Abstract:
    A permanent magnetic mask chuck is described herein. The permanent magnetic mask chuck includes a body with a plurality of permanent magnets positioned therein. The permanent magnets can then deliver a magnetic force to a mask to position and hold the mask over or on the substrate for further deposition.

Resumes

Zuoqian Wang Photo 1

Zuoqian Joe Wang Santa Clara, CA

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Work:
Applied Materials, AKT

Jun 2013 to 2000
R&D Mechanical Engineer
University of California
Berkeley, CA
Aug 2008 to May 2013
Graduate Student Researcher
University of California and Lawrence Berkeley National Lab
Berkeley, CA
Sep 2008 to Aug 2010
Graduate Student Researcher
General Motors

Jun 2007 to Jul 2007
Research Intern
Education:
UC Berkeley
2008 to 2013
Ph.D. in Mechanical Engineering (Minors: Electrical Engineering and Materials)
University of California
Santa Barbara, CA
2012 to 2012
Certificate in Summer School for Inorganic Materials for Energy Conversion and Storage
Haas School of Business, UC Berkeley
2009 to 2012
Certificate
UC Berkeley
2008 to 2010
Master of Science in Mechanical Engineering
Jilin University
2004 to 2008
Bachelor of Engineering in Automotive Engineering
Skills:
*Electrochemical Characterization: EIS, CV, Galvanic Charging/Discharging Techniques, Temperature and Humidity Environmental Test, Encapsulations Permeability Test *Materials Physical Characterization: Microscopies (SEM, OM, AFM), Profilometries, Tensiometry, XRD, DSC, Van Der Pauw Method, Thermal Conductivity Measurement *Materials Rheological and Mechanical Properties Test and Analysis *MEMS and IC Device Design: Clean Room Experience in Microfabrication Technologies *CAD Modeling: AutoCAD, SolidWorks, CATIA, NX Unigraphics *Finite Element Analysis and Programming: COMSOL Multiphysics, ADAMS, MATLAB, C *Languages: English (Fluent), Mandarin (Native), Japanese (Basic)

Facebook

Zuoqian Wang Photo 2

Zuoqian Wang

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Friends:
Sharon Shiwen Xue
Zuoqian Wang Photo 3

Zuoqian Wang

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Friends:
Anna Osada, Yuiko Sato, Olga Zarubina
Zuoqian Wang Photo 4

Zuoqian Wang

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Friends: Anna Osada, , Sandra Ikwele, Arc Archisam, Yuiko Sato, Olga Zarubina
Zuoqian Wang Photo 5

Zuoqian Wang

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Friends: Wei Sun, Heimdall Siao, Alic Chen, Xi Yin, Jack Ye, Zhichao Song, Tracy Zhen

Youtube

(O Happy Day Tim Hughes) VCC Chinese Worship

Victory Chinese Cell (VCCTulsa.com) meets every Saturday at 11am. Here...

  • Category:
    People & Blogs
  • Uploaded:
    16 Nov, 2008
  • Duration:
    5m 54s

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