Todd A Dunn

US Patent:

20130104992, May 2, 2013

Filed:

Dec 6, 2011

Appl. No.:

13/312591

Inventors:

Todd Dunn - Cave Creek AZ, US
Carl White - Gilbert AZ, US
Michael Manasco - Tempe AZ, US

Assignee:

ASM AMERICA, INC. - Phoenix AZ

International Classification:

F16K 49/00

US Classification:

137 1, 137334

Abstract:

A valve assembly including a mounting block having a first surface, a plurality of valves connected to the mounting block first surface, at least one fluid line connecting the plurality of valves spaced apart from the mounting block first surface, a heating element spaced apart from the at least one fluid line and located within a first insulating layer, and wherein the first insulating layer extends less than completely around the at least one fluid line.

US Patent:

20130129577, May 23, 2013

Filed:

Nov 14, 2012

Appl. No.:

13/677151

Inventors:

ASM IP Holding B.V. - Almere, NL
Eric Shero - Phoenix AZ, US
Carl White - Gibert AZ, US
Fred Alokozai - Scottsdale AZ, US
Jerry Winkler - Gilbert AZ, US
Todd Dunn - Cave Creek AZ, US

Assignee:

ASM Holding B.V. - Almere

International Classification:

B01J 8/00

US Classification:

422236

Abstract:

A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.

US Patent:

20130230814, Sep 5, 2013

Filed:

Mar 2, 2012

Appl. No.:

13/411271

Inventors:

Todd Dunn - Cave Creek AZ, US
Carl White - Gilbert AZ, US
Michael Halpin - Scottsdale AZ, US
Eric Shero - Phoenix AZ, US
Jerry Winkler - Gilbert AZ, US

Assignee:

ASM IP HOLDING B.V. - Almere

International Classification:

F27D 3/00
F27D 5/00

US Classification:

432 9, 432253, 432120

Abstract:

A substrate supporting assembly in a reaction space includes a heater, a substrate support member, and a shim positioned between the heater and the substrate support member. The shim may be removably secured between the heater and the substrate support member. The shim may further include an inner surface defining a perimeter of a gap. The gap may be further defined by a bottom surface of the substrate support member and a top surface of the heater. The substrate support member may further include a shoulder positioned radially outside of a substrate support position and wherein the shim inner surface is radially aligned with the substrate support member shoulder.

US Patent:

20140000843, Jan 2, 2014

Filed:

Jun 27, 2012

Appl. No.:

13/535214

Inventors:

Todd Dunn - Cave Creek AZ, US
Fred Alokozai - Scottsdale AZ, US
Jerry Winkler - Gilbert AZ, US
Michael Halpin - Scottsdale AZ, US

Assignee:

ASM IP Holding B.V. - Almere

International Classification:

H01L 21/324
F28F 7/00

US Classification:

165 802, 165 805

Abstract:

A wafer processing apparatus may include a susceptor having a top side and a backside, a susceptor heater having a spacing member and a heating member, a shim removably mounted between the susceptor and the susceptor heater, a cavity formed by the susceptor backside, the susceptor heater, and the shim, a fluid inlet communicating with the cavity, and a plurality of fluid outlets communicating with the cavity.

US Patent:

20220403516, Dec 22, 2022

Filed:

Jun 16, 2022

Appl. No.:

17/842007

Inventors:

- Almere, NL
Eric Shero - Phoenix AZ, US
Todd Dunn - Cave Creek AZ, US
Jonathan Bakke - Phoenix AZ, US
Jereld Winkler - Gilbert AZ, US
Xingye Wang - Gilbert AZ, US
Eric Jen Cheng Liu - Phoenix AZ, US

International Classification:

C23C 16/455
C23C 16/02
C23C 16/40
C23C 16/56

Abstract:

Reactor systems and methods for forming a layer comprising indium gallium zinc oxide are disclosed. The layer comprising indium gallium zinc oxide can be formed using one or more reaction chambers of a process module.

US Patent:

20220380895, Dec 1, 2022

Filed:

Jul 29, 2022

Appl. No.:

17/816052

Inventors:

- Almere, NL
Todd Robert Dunn - Cave Creek AZ, US
Carl Louis White - Gilbert AZ, US
Herbert Terhorst - Amersfoort, NL
Eric James Shero - Phoenix AZ, US
Bhushan Zope - Phoenix AZ, US

International Classification:

C23C 16/458
C23C 16/455
C23C 16/46
H01L 21/687

Abstract:

A workpiece susceptor body can include a front face configured to support a workpiece, a back face opposite the front face, a workpiece contact zone at least partially forming a support boundary on an inner portion of the front face, and a plurality of axial channels disposed within the susceptor body. The workpiece contact zone can be disposed radially inward of an outer edge of a workpiece positioned on the front face in a processing configuration. Each of the plurality of axial channels may connect to corresponding openings extending into an outer portion of the front face. Each of the openings may be disposed radially outward of the workpiece contact zone of the susceptor body.

US Patent:

20230089167, Mar 23, 2023

Filed:

Sep 16, 2022

Appl. No.:

17/946304

Inventors:

- Almere, NL
Gnyanesh Trivedi - Tempe AZ, US
Yingzong Bu - Powell OH, US
Todd Dunn - Cave Creek AZ, US
Thomas Fitzgerald - Gilbert AZ, US
Akshay Phadnis - Phoenix AZ, US
Paul Ma - Scottsdale AZ, US

International Classification:

C23C 16/44

Abstract:

Gas-phase reactor systems and methods of cleaning same are disclosed. Exemplary systems include a cleaning gas diffuser within a reaction chamber to facilitate cleaning of components, such as a susceptor, within the reaction chamber. The cleaning gas diffuser can be configured to provide a flow of a cleaning reactant over one or more surfaces within the reaction chamber.

US Patent:

20230061477, Mar 2, 2023

Filed:

Aug 25, 2022

Appl. No.:

17/895370

Inventors:

- Almere, NL
Rohan Rane - Tempe AZ, US
Jereld Winkler - Gilbert AZ, US
Ankit Kimtee - Phoenix AZ, US
Todd Robert Dunn - Cave Creek AZ, US

International Classification:

C23C 16/458
C23C 16/455

Abstract:

A reaction chamber may comprise a reaction chamber volume enclosed within the reaction chamber; a susceptor configured to support a substrate disposed in the reaction chamber volume; a reaction space above the susceptor, and a lower chamber space below the susceptor, within the reaction chamber volume; and/or a sealing system causing the reaction space and the lower chamber space to be at least partially fluidly separate. A sealing system may comprise a spacer plate surrounding and coupled to the susceptor; and/or a spring coupled to the spacer plate and the susceptor having a spring bias toward a compressed position or an extended position, such that the spring bias facilitates creation of at least a partial seal between the spacer plate and the susceptor, causing at least partial fluid separation between the reaction space and the lower chamber space as the susceptor moves up and down within the reaction chamber.