Shoghig K Mesropian

US Patent:

20090056799, Mar 5, 2009

Filed:

Aug 29, 2007

Appl. No.:

11/846932

Inventors:

Geoffrey S. Kinsey - Pasadena CA, US
Shoghig Mesropian - Tarzana CA, US

International Classification:

H01L 31/04
H01L 21/00
H01L 31/0216

US Classification:

136256, 136252, 136259, 438 69, 257E31001

Abstract:

A photovoltaic cell comprising a selectively patterned, transparent, conductive coating (TCC) on a sunward surface. The selectively patterned TCC is contiguous with at least some highly conductive gridlines on the sunward surface. A portion of the sunward surface of the semiconductor wafer is not covered by either the gridlines or the TCC. Also disclosed are methods of manufacturing a photovoltaic cell comprising a selectively patterned, transparent, conductive coating (TCC) on a sunward surface. The methods include the step of modeling the optical and electrical properties of the semiconductor, the gridlines, and the TCC to determine a pattern for the TCC that results in a low relative power loss for the photovoltaic cell.

US Patent:

20140345683, Nov 27, 2014

Filed:

May 24, 2013

Appl. No.:

13/901774

Inventors:

- Chicago IL, US
Shoghig Mesropian - Tarzana CA, US
Dimitri D. Krut - Encino CA, US

Assignee:

The Boeing Company - Chicago IL

International Classification:

H01L 31/02
H01L 31/18

US Classification:

136256, 438 8

Abstract:

Provided are methods and systems for treating shunts on solar cell substrates. Also provided are solar cells including such substrates. A shunt detected on a substrate proximate to a metallized grid pattern is electrically disconnected from at least the bus portion of the grid, which reduces shunt's impact on performance on the solar cell. An antireflective layer may be disposed between the shunt and a portion of the grid extending over the shunt. The exposure pattern of a photoresist used to form the antireflective layer may be adjusted accordingly to achieve this result. In some embodiments, the metallized grid may be modified by adjusting the exposure pattern of a photoresist used to form this grid. The grid may be modified to avoid any contact between the grid and the shunt or to disconnect a portion of the grid contacting the shunt from the bus portion area of the grid.