Robert Anthony Vaccaro

US Patent:

7833570, Nov 16, 2010

Filed:

Jun 27, 2008

Appl. No.:

12/216047

Inventors:

Gary L. Harkleroad - Indiana PA, US
Robert Vaccaro - Greensburg PA, US

Assignee:

Sony Corporation - Tokyo
Sony Electronics Inc. - Park Ridge NJ

International Classification:

B05D 5/12
B44C 1/22

US Classification:

427 66, 216 12, 216 41

Abstract:

Dimensional stabilization of a precision etched mask used in the production of organic light emitting diode display panels. This may entail securing a sheet of mask material, and then heating the sheet of mask material to a temperature within a predetermined range for a predetermined amount of time to produce a treated sheet of mask material. The treated sheet of mask material may then be used to fabricate a dimensionally stable precision etched mask, such as by exposing and etching the treated sheet of mask material.

US Patent:

7972442, Jul 5, 2011

Filed:

Jun 27, 2008

Appl. No.:

12/216046

Inventors:

Robert Vaccaro - Greensburg PA, US

Assignee:

Sony Corporation - Tokyo
Sony Electronics Inc. - Park Ridge NJ

International Classification:

C23C 16/00

US Classification:

118720, 118721

Abstract:

A photoplate for manufacturing a deposition mask that is used to form a matrix of pixel areas used in a display panel. The photoplate comprises a layer of material such as quartz, on which a matrix of pixel etching areas is defined. The pixel etching areas are configured to form pixel areas having a specified separation from each other in a vertical direction. The pixel etching areas on the photoplate include an outer periphery having a generally rectangular shape with elongated corners.

US Patent:

20200362466, Nov 19, 2020

Filed:

May 13, 2020

Appl. No.:

15/930484

Inventors:

- Glassport PA, US
Edward Palanko - New Stanton PA, US
Robert Vaccaro - Greensburg PA, US
Jordan Incerpi - Pittsburgh PA, US

Assignee:

TECH MET, INC. - Glassport PA

International Classification:

C23F 1/40
A61L 27/36
A61L 27/06
A61L 31/02

Abstract:

Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and an amine, one or more chelating agents, and optionally iron (Fe) and/or certain component metals of the metal or alloy to be etched. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

US Patent:

20200176243, Jun 4, 2020

Filed:

Feb 11, 2020

Appl. No.:

16/787432

Inventors:

- Glassport PA, US
Robert Vaccaro - Greensburg PA, US
Edward Palanko - New Stanton PA, US
Mark Megela - Mount Pleasant PA, US

Assignee:

Tech Met, Inc. - Glassport PA

International Classification:

H01L 21/02
B23K 26/361
B23K 26/00
B23K 26/046
B23K 26/08
B23K 26/40
B23K 26/10
B23K 26/0622
B23K 26/352
C23F 1/04
C23F 1/02
C23F 1/00
B26D 3/08
B26D 7/26
B23H 3/00
B23K 26/402
B23K 26/362
G02B 27/09
G02B 27/30
H01S 5/00

Abstract:

Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.

US Patent:

20190051514, Feb 14, 2019

Filed:

Oct 18, 2018

Appl. No.:

16/163904

Inventors:

Michael Vidra - Export PA, US
Robert Vaccaro - Greensburg PA, US
Edward Palanko - New Stanton PA, US
Mark Megela - Mount Pleasant PA, US

Assignee:

Tech Met, Inc. - Glassport PA

International Classification:

H01L 21/02
G02B 27/09
G02B 27/30
H01S 5/00

Abstract:

Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.

US Patent:

20170259444, Sep 14, 2017

Filed:

Mar 13, 2017

Appl. No.:

15/457313

Inventors:

Michael Vidra - Export PA, US
James Ringer - Jeanette PA, US
Robert Vaccaro - Greensburg PA, US
Mark Megela - Mount Pleasant PA, US
Edward Palanko - New Stanton PA, US

Assignee:

Tech Met, Inc. - Glassport PA

International Classification:

B26D 3/08
C23F 1/00
B23K 26/402
B23H 3/00
B26D 7/26
B23K 26/362

Abstract:

Methods and devices for etching patterns on interior surfaces of hollow objects are described. The method may include preparation of the interior surface of the object, such as pre-cleaning, and coating the interior surface of the object. A pattern may then be generated on the interior surface of the object by any of mechanical or manual scribing and peeling, laser ablation, or photoresist coating and laser exposure, development and hardening. The pattern is then etched using chemical etchants, and finished to remove remaining coating, provide surface passivation and/or protectant application. Mechanical and laser devices which may facilitate pattern generation are also described.