Nikolai N Kalnin

US Patent:

20200035540, Jan 30, 2020

Filed:

Jul 30, 2018

Appl. No.:

16/049037

Inventors:

- Santa Clara CA, US
Mehmet Samir - Mountain View CA, US
Nikolai Kalnin - Belmont CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/687
G01C 9/02
H01L 21/67

Abstract:

Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.

US Patent:

20190362944, Nov 28, 2019

Filed:

Aug 9, 2019

Appl. No.:

16/537048

Inventors:

- Santa Clara CA, US
Hideo Sugai - Kasugai-shi, JP
Nikolai Kalnin - Pleasanton CA, US
Soonam Park - Sunnyvale CA, US
Toan Tran - San Jose CA, US
Dmitry Lubomirsky - Cupertino CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01J 37/32
H01L 21/67

Abstract:

A system includes a process chamber, a housing that defines a waveguide cavity, and a first conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment devices that can adjust at least a position of the first conductive plate, and a second conductive plate, coupled with the housing, between the waveguide cavity and the process chamber. Electromagnetic radiation can propagate from the waveguide cavity into the process chamber through apertures in the second conductive plate. The system also includes a dielectric plate that seals off the process chamber from the waveguide cavity, and one or more electronics sets that transmit the electromagnetic radiation into the waveguide cavity. A plasma forms when at least one process gas is within the chamber, and the electromagnetic radiation propagates into the process chamber from the waveguide cavity.

US Patent:

20180366378, Dec 20, 2018

Filed:

Jun 16, 2017

Appl. No.:

15/625454

Inventors:

- Santa Clara CA, US
Soonam Park - Sunnyvale CA, US
Tae Seung Cho - San Jose CA, US
Dmitry Lubomirsky - Cupertino CA, US
Nikolai Kalnin - Belmont CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/66
H01L 21/67
H01J 37/32
C23C 16/513

Abstract:

Methods of monitoring a plasma while processing a semiconductor substrate are described. In embodiments, the methods include determining the difference in power between the power delivered from the plasma power supply and the power received by the plasma in a substrate processing chamber. The power received may be determined using a V/I sensor positioned after the matching circuit. The power reflected or the power lost is the difference between the delivered power and the received power. The process may be terminated by removing the delivered power if the reflected power is above a setpoint. The Vmay further be fourier transformed into frequency space and compared to the stored fourier transform of a healthy plasma process. Missing frequencies from the Vfourier transform may independently or further indicate an out-of-tune plasma process and the process may be terminated.

US Patent:

20180226230, Aug 9, 2018

Filed:

Feb 3, 2017

Appl. No.:

15/424488

Inventors:

- Santa Clara CA, US
Hideo Sugai - Kasugai-shi, JP
Nikolai Kalnin - Belmont CA, US
Soonam Park - Sunnyvale CA, US
Toan Tran - San Jose CA, US
Dmitry Lubomirsky - Cupertino CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01J 37/32
H01L 21/67

Abstract:

A system includes a process chamber, a housing that defines a waveguide cavity, and a first conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment devices that can adjust at least a position of the first conductive plate, and a second conductive plate, coupled with the housing, between the waveguide cavity and the process chamber. Electromagnetic radiation can propagate from the waveguide cavity into the process chamber through apertures in the second conductive plate. The system also includes a dielectric plate that seals off the process chamber from the waveguide cavity, and one or more electronics sets that transmit the electromagnetic radiation into the waveguide cavity. A plasma forms when at least one process gas is within the chamber, and the electromagnetic radiation propagates into the process chamber from the waveguide cavity.

US Patent:

20170023642, Jan 26, 2017

Filed:

May 27, 2016

Appl. No.:

15/166716

Inventors:

- Fremont CA, US
Christopher T. Lane - Los Gatos CA, US
Mark Gardiner - Portland OR, US
Morgan T. Johnson - Beaverton OR, US
Doug Buck - Salinas CA, US
Nikolai Kalnin - Santa Clara CA, US

Assignee:

Translarity, Inc. - Fremont CA

International Classification:

G01R 31/28
G01R 1/04
G01R 1/073

Abstract:

Systems and methods for testing semiconductor wafers using a wafer translator are disclosed herein. In one embodiment, an apparatus for testing semiconductor dies includes a semiconductor wafer translator having a wafer-side positioned to face toward a device under test, and an inquiry-side facing away from the wafer-side. The apparatus also includes a flexible arm peripherally connected to the wafer translator, and an evacuation opening within the flexible arm or within the wafer translator. The evacuation opening is open to a flow of a gas in a first position of the flexible arm, and closed to a flow of the gas in a second position of the flexible arm.