Luke Wesley Bonecutter

US Patent:

20140076688, Mar 20, 2014

Filed:

Sep 5, 2013

Appl. No.:

14/018887

Inventors:

Malcolm N. Daniel - Austin TX, US
Luke Bonecutter - Cedar Park TX, US
Jason M. Schaller - Austin TX, US
Charles T. Carlson - Cedar Park TX, US
William T. Weaver - Austin TX, US

International Classification:

B65G 47/52

US Classification:

1983461

Abstract:

A system and method for the handling of workpieces in a workpiece processing system is disclosed. The system utilizes three conveyor belts, where one may be a loading belt, feeding unprocessed workpieces from its associated workpiece carrier to a processing system. A second conveyor belt may be an unloading belt, receiving processed workpieces from the processing system and filling its associated workpiece carrier. The third conveyor belt may be exchanging its workpiece carrier during this time, so that it is available to start operating as the loading belt once all of the workpieces have been removed from the workpiece carrier associated with the first conveyor belt.

US Patent:

20060250788, Nov 9, 2006

Filed:

Apr 12, 2006

Appl. No.:

11/402669

Inventors:

Michael Hodge - San Antonio TX, US
Luke Bonecutter - San Antonio TX, US

International Classification:

F21S 8/00

US Classification:

362147000

Abstract:

An adjustable downlight fixture includes an adjustable mounting for a light source. The adjustable mounting for the light source may be rotated about a substantially vertical axis and tilted about a substantially horizontal axis from underneath the adjustable downlight fixture without having to remove the adjustable downlight fixture from its mounting within the ceiling.

US Patent:

20230032854, Feb 2, 2023

Filed:

Oct 13, 2022

Appl. No.:

17/965491

Inventors:

- Santa Clara CA, US
Jason M. Schaller - Austin TX, US
Luke Bonecutter - Cedar Park TX, US
David Blahnik - Round Rock TX, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/67
B65G 47/90
H01L 21/687
H01L 21/68

Abstract:

Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.

US Patent:

20230005783, Jan 5, 2023

Filed:

Sep 8, 2022

Appl. No.:

17/940369

Inventors:

- Santa Clara CA, US
Luke Bonecutter - Cedar Park TX, US
Charles T. Carlson - Austin TX, US
Rajkumar Thanu - Santa Clara CA, US
Karuppasamy Muthukamatchi - Bangalore, IN
Jeff Hudgens - San Francisco CA, US
Benjamin Riordon - Newburyport MA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/687
B65G 47/90
H01L 21/67

Abstract:

Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.

US Patent:

20210013067, Jan 14, 2021

Filed:

Jul 7, 2020

Appl. No.:

16/922447

Inventors:

- Santa Clara CA, US
Jason M. Schaller - Austin TX, US
Luke Bonecutter - Cedar Park TX, US
David Blahnik - Round Rock TX, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/67
B65G 47/90
H01L 21/68
H01L 21/687

Abstract:

Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.

US Patent:

20210013068, Jan 14, 2021

Filed:

Jul 7, 2020

Appl. No.:

16/922536

Inventors:

- Santa Clara CA, US
Charles T. Carlson - Austin TX, US
Luke Bonecutter - Cedar Park TX, US
David Blahnik - Round Rock TX, US
Karuppasamy Muthukamatchi - Bangalore, IN
Jeff Hudgens - San Francisco CA, US
Benjamin Riordon - Newburyport MA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/67
B65G 47/90
H01L 21/68
H01L 21/687

Abstract:

Exemplary substrate processing systems may include a transfer region housing defining a transfer region, and including substrate supports and a transfer apparatus. The transfer apparatus may include a central hub having a housing, and including a first shaft and a second shaft. The housing may be coupled with the second shaft, and may define an internal housing volume. The transfer apparatus may include a plurality of arms equal to a number of substrate supports of the plurality of substrate supports. Each arm of the plurality of arms may be coupled about an exterior of the housing. The transfer apparatus may include a plurality of arm hubs disposed within the internal housing volume. Each arm hub of the plurality of arm hubs may be coupled with an arm of the plurality of arms through the housing. The arm hubs may be coupled with the first shaft of the central hub.

US Patent:

20210013084, Jan 14, 2021

Filed:

Jul 7, 2020

Appl. No.:

16/922727

Inventors:

- Santa Clara CA, US
Luke Bonecutter - Cedar Park TX, US
Charles T. Carlson - Austin TX, US
Rajkumar Thanu - Santa Clara CA, US
Karuppasamy Muthukamatchi - Bangalore, IN
Jeff Hudgens - San Francisco CA, US
Benjamin Riordon - Newburyport MA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/687
H01L 21/67
B65G 47/90

Abstract:

Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.

US Patent:

20200219698, Jul 9, 2020

Filed:

Nov 8, 2019

Appl. No.:

16/678081

Inventors:

- Santa Clara CA, US
Abhijit KANGUDE - Fremont CA, US
Luke BONECUTTER - Cedar Park TX, US
Rupankar CHOUDHURY - BANGALORE, IN

International Classification:

H01J 37/32
H01L 21/67
H01L 21/683

Abstract:

Embodiments of the present disclosure generally relate to a semiconductor processing apparatus. More specifically, embodiments of the disclosure relate to generating and controlling plasma. A process chamber includes a chamber body that includes one or more chamber walls and defines a processing region. The process chamber also includes two or more inductively driven radio frequency (RF) coils in a concentric axial alignment, the RF coils arranged near the chamber walls to strike and sustain a plasma inside the chamber body, where at least two of the two or more RF coils are in a recursive configuration.