James R Baugh

US Patent:

7008487, Mar 7, 2006

Filed:

Mar 4, 2002

Appl. No.:

10/090986

Inventors:

Shad Hedges - Meridian ID, US
James Baugh - Boise ID, US

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

B08B 3/02

US Classification:

134 33, 134182, 134183

Abstract:

A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

US Patent:

7300526, Nov 27, 2007

Filed:

Mar 6, 2006

Appl. No.:

11/368895

Inventors:

Shad Hedges - Meridian ID, US
James Baugh - Boise ID, US

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

B08B 3/02

US Classification:

134 33, 134182, 134183

Abstract:

A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

US Patent:

7767365, Aug 3, 2010

Filed:

Aug 31, 2006

Appl. No.:

11/515089

Inventors:

Craig M. Carpenter - Boise ID, US
James Baugh - Boise ID, US
Steve McDonald - Star ID, US
Robert Rasmussen - Kuna ID, US
J. Brett Rolfson - Boise ID, US
Azeddine Zerrade - Boise ID, US

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G03F 1/00

US Classification:

430 5, 134 1, 216 67

Abstract:

A method for removing impurities (e. g. , atomic sulfur) from a reticle for use in photolithography is provided. In one embodiment, a reticle (or photomask) comprising a plate, a first layer over the plate, and a photoresist layer over the first layer is provided. The photoresist layer is removed with a first chemistry comprising a sulfur-containing compound. At least a portion of the first layer is removed with a second chemistry comprising a sulfur-containing etchant, thereby exposing portions of the plate. Removing the photoresist layer and/or at least a portion of the first layer leaves sulfur on at least portions of the reticle. In a cleaning step, the reticle is contacted with one or more excited species of oxygen to remove residual sulfur and other contaminants, such as carbon, sulfur and oxygen-containing species. Methods of embodiments can be used to clean, e. g. , binary photomasks, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks.

US Patent:

8627836, Jan 14, 2014

Filed:

Nov 27, 2007

Appl. No.:

11/945658

Inventors:

Shad Hedges - Meridian ID, US
James Baugh - Boise ID, US

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

B08B 3/12
B08B 6/00

US Classification:

134182, 134183, 134902

Abstract:

A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Author:

James Emory Baugh

ISBN #:

0595749828

Author:

James R. Baugh

ISBN #:

0306435616

Author:

James R. Baugh

ISBN #:

0882892460