Oregon State University 2004 - 2011
Doctor of Philosophy (PhD), Electrical Engineering
Embry Riddle Aeronautical University-Prescott 1999 - 2004
Bachelor of Science (B.S.), Computer Engineering
Skills:
Silicon Semiconductors Patents Image Sensors Asic Ic Soc Sensors Analog Circuit Design Electronics Verilog Characterization Cmos Analog Design of Experiments Integrated Circuits Program Management Fpga
Leonard Forbes - Corvallis OR, US Drake A. Miller - Tigard OR, US
International Classification:
H01L 21/425 H01L 21/336
US Classification:
438514, 257E21409, 257288
Abstract:
The effects of random telegraph noise signal (RTS) or equivalently 1/f noise on MOS devices, circuits, and sensors is described. Techniques are disclosed for minimizing this RTS and low frequency noise by minimizing the number of ionized impurity atoms in the wafer, substrate, well, pillar, or fin behind the channel of the MOS transistors. This noise reduction serves to reduce the errors in devices, sensors, and analog integrated circuits and error rates in digital integrated circuits and memories.
Photosensitive Imaging Devices And Associated Methods
Homayoon Haddad - Beaverton OR, US Jutao Jiang - Tigard OR, US Jeffrey McKee - Tualatin OR, US Drake Miller - Tigard OR, US Chintamani Palsule - Lake Oswego OR, US Leonard Forbes - Corvallis OR, US
Backside illuminated photosensitive devices and associated methods are provided. In one aspect, for example, a backside-illuminated photosensitive imager device can include a semiconductor substrate having multiple doped regions forming a least one junction, a textured region coupled to the semiconductor substrate and positioned to interact with electromagnetic radiation, and a passivation region positioned between the textured region and the at least one junction. The passivation region is positioned to isolate the at least one junction from the textured region, and the semiconductor substrate and the textured region are positioned such that incoming electromagnetic radiation passes through the semiconductor substrate before contacting the textured region. Additionally, the device includes an electrical transfer element coupled to the semiconductor substrate to transfer an electrical signal from the at least one junction.
Photosensitive Imaging Devices And Associated Methods
Homayoon Haddad - Beaverton OR, US Jutao Jiang - Tigard OR, US Jeffrey McKee - Tualatin OR, US Drake Miller - Tigard OR, US Leonard Forbes - Corvallis OR, US Chintamani Palsule - Lake Oswego OR, US
Photosensitive devices and associated methods are provided. In one aspect, for example, a photosensitive imager device can include a semiconductor substrate having multiple doped regions forming at least one junction, a textured region coupled to the semiconductor substrate and positioned to interact with electromagnetic radiation, and an electrical transfer element coupled to the semiconductor substrate and operable to transfer an electrical signal from the at least one junction. In one aspect, the textured region is operable to facilitate generation of an electrical signal from the detection of infrared electromagnetic radiation. In another aspect, interacting with electromagnetic radiation further includes increasing the semiconductor substrate's effective absorption wavelength as compared to a semiconductor substrate lacking a textured region.
High Speed Photosensitive Devices And Associated Methods
James Carey - Waltham MA, US Drake Miller - Tigard OR, US
Assignee:
SiOnyx, Inc. - Beverly MA
International Classification:
H01L 31/0236
US Classification:
257443, 257461, 438 71, 257E3113
Abstract:
High speed optoelectronic devices and associated methods are provided. In one aspect, for example, a high speed optoelectronic device can include a silicon material having an incident light surface, a first doped region and a second doped region forming a semiconductive junction in the silicon material, and a textured region coupled to the silicon material and positioned to interact with electromagnetic radiation. The optoelectronic device has a response time of from about 1 picosecond to about 5 nanoseconds and a responsivity of greater than or equal to about 0.4 A/W for electromagnetic radiation having at least one wavelength from about 800 nm to about 1200 nm.
Process Module For Increasing The Response Of Backside Illuminated Photosensitive Imagers And Associated Methods
Homayoon Haddad - Beaverton OR, US Jeffrey McKee - Tualatin OR, US Jutao Jiang - Tigard OR, US Drake Miller - Tigard OR, US Chintamani Palsule - Lake Oswego OR, US Leonard Forbes - Corvallis OR, US
International Classification:
H01L 31/0232 H01L 31/18
US Classification:
257432, 438 71, 257E31127
Abstract:
Backside illuminated photosensitive devices and associated methods are provided. In one aspect, for example, a backside-illuminated photosensitive imager device can include a semiconductor substrate having multiple doped regions forming a least one junction, a textured region coupled to the semiconductor substrate and positioned to interact with electromagnetic radiation where the textured region includes surface features sized and positioned to facilitate tuning to a preselected wavelength of light, and a dielectric region positioned between the textured region and the at least one junction. The dielectric region is positioned to isolate the at least one junction from the textured region, and the semiconductor substrate and the textured region are positioned such that incoming electromagnetic radiation passes through the semiconductor substrate before contacting the textured region. Additionally, the device includes an electrical transfer element coupled to the semiconductor substrate to transfer an electrical signal from the at least one junction.
Photosensitive Imagers Having Defined Textures For Light Trapping And Associated Methods
Homayoon Haddad - Beaverton OR, US Jeffrey McKee - Tualatin OR, US Jutao Jiang - Tigard OR, US Drake Miller - Tigard OR, US Chintamani Palsule - Lake Oswego OR, US Leonard Forbes - Corvalils OR, US
International Classification:
H01L 31/0236 H01L 31/18 H01L 27/148
US Classification:
257432, 438 71, 257E3113, 257E27151, 257E31128
Abstract:
Photosensitive devices and associated methods are provided. In one aspect, for example, a frontside-illuminated photosensitive imager devices can include a semiconductor substrate having multiple doped regions forming a least one junction and a textured region coupled to the semiconductor substrate and positioned to interact with electromagnetic radiation on an opposite side of the semiconductor substrate from the multiple doped regions. The textured region can include surface features sized and positioned to facilitate tuning to a preselected wavelength of light. The device can also include an electrical transfer element coupled to the semiconductor substrate and operable to transfer an electrical signal from the at least one junction.
High Speed Photosensitive Devices And Associated Methods
High speed optoelectronic devices and associated methods are provided. In one aspect, for example, a high speed optoelectronic device can include a silicon material having an incident light surface, a first doped region and a second doped region forming a semiconductive junction in the silicon material, and a textured region coupled to the silicon material and positioned to interact with electromagnetic radiation. The optoelectronic device has a response time of from about 1 picosecond to about 5 nanoseconds and a responsivity of greater than or equal to about 0.4 A/W for electromagnetic radiation having at least one wavelength from about 800 nm to about 1200 nm.
Process Module For Increasing The Response Of Backside Illuminated Photosensitive Imagers And Associated Methods
- Beverly MA, US Jeffrey MCKEE - Tualatin OR, US Jutao JIANG - Tigard OR, US Drake MILLER - Tigard OR, US Chintamani PALSULE - Lake Oswego OR, US Leonard FORBES - Corvallis OR, US
Backside illuminated photosensitive devices and associated methods are provided. In one aspect, for example, a backside-illuminated photosensitive imager device can include a semiconductor substrate having multiple doped regions forming a least one junction, a textured region coupled to the semiconductor substrate and positioned to interact with electromagnetic radiation where the textured region includes surface features sized and positioned to facilitate tuning to a preselected wavelength of light, and a dielectric region positioned between the textured region and the at least one junction. The dielectric region is positioned to isolate the at least one junction from the textured region, and the semiconductor substrate and the textured region are positioned such that incoming electromagnetic radiation passes through the semiconductor substrate before contacting the textured region. Additionally, the device includes an electrical transfer element coupled to the semiconductor substrate to transfer an electrical signal from the at least one junction.
Name / Title
Company / Classification
Phones & Addresses
Drake Miller
DRAKE BUILT CONSTRUCTION LC
Googleplus
Drake Miller
Work:
Wal-Mart - Deli Associate (2011) Farmington Public Library - Teen Service Associate (2006-2010)
Dodger sophomore quarterback Drake Miller continues to rank near the top of the 4A charts with 1,032 yards passing at 65 percent accuracy (96 of 148). Senior receiver Jonathan Bowser (31 catches, 351 yards), junior Trey Mosley (28 for 356 and 5 TDs) and junior Tyrnan Lara (22 for 182) are all among