Dana D Durham

age ~76

from Brooklyn, NY

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Also known as:

Dana Nurham

Phone and address:: 2701 Newkirk Ave, Brooklyn, NY 11226
7186931732

Connected to:

Dana Durham Phones & Addresses

2701 Newkirk Ave, Brooklyn, NY 11226 • 7186931732
2701 Newkirk Ave APT 2B, Brooklyn, NY 11226 • 7186931732

Work

Position:

Clerical/White Collar

Education

Degree:

High school graduate or higher

Us Patents

Image Reversal Negative Working O-Quinone Diazide And Cross-Linking Compound Containing Photoresist Process With Thermal Curing Treatment And Element Produced Therefrom
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US Patent:

52178404, Jun 8, 1993
Filed:

May 25, 1990
Appl. No.:

7/530545
Inventors:

Mark A. Spak - Edison NJ
Donald Mammato - Lebanon NJ
Dana Durham - East Greenwich RI
Sangya Jain - Bridgewater NJ
Assignee:

Hoechst Celanese Corporation - Somerville NJ
International Classification:

G03F 7023
G03F 709
G03F 730
G03F 738
US Classification:

430165
Abstract:

A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.

Image Reversal Negative Working O-Quinone Diazide And Cross-Linking Compound Containing Photoresist Process With Thermal Curing Treatment
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US Patent:

49313819, Jun 5, 1990
Filed:

Nov 8, 1988
Appl. No.:

7/268640
Inventors:

Mark A. Spak - Edison NJ
Donald Mammato - Lebanon NJ
Dana Durham - Bloomsbury NJ
Sangya Jain - Somerville NJ
Assignee:

Hoechst Celanese Corporation - Somerville NJ
International Classification:

G03F 726
US Classification:

430325
Abstract:

A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.

Image Reversal Negative Working O-Naphthoquinone Diazide And Cross-Linking Compound Containing Photoresist Process With Thermal Curing
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US Patent:

52565220, Oct 26, 1993
Filed:

Dec 30, 1991
Appl. No.:

7/815645
Inventors:

Mark A. Spak - Edison NJ
Donald Mammato - Lebanon NJ
Dana Durham - East Greenwich RI
Sangya Jain - Bridgewater NJ
Assignee:

Hoechst Celanese Corporation - Somerville NJ
International Classification:

G03F 730
US Classification:

430325
Abstract:

A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.

Image Reversal Negative Working O-Napthoquinone Diazide And Cross-Linking Compound Containing Photoresist Process With Thermal Curing
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US Patent:

49295365, May 29, 1990
Filed:

Nov 8, 1988
Appl. No.:

7/268639
Inventors:

Mark A. Spak - Edison NJ
Donald Mammato - Lebanon NJ
Dana Durham - Bloomsbury NJ
Sangya Jain - Bridgewater NJ
Assignee:

Hoechst Celanese Corporation - Somerville NJ
International Classification:

G03F 726
US Classification:

430325
Abstract:

A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.

Image Reversal Negative Working Photoresist Containing O-Quinone Diazide And Cross-Linking Compound
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US Patent:

53994566, Mar 21, 1995
Filed:

Nov 19, 1992
Appl. No.:

7/978099
Inventors:

Mark A. Spak - Edison NJ
Donald Mammato - Lebanon NJ
Dana Durham - East Greenwich RI
Sangya Jain - Bridgewater NJ
Assignee:

Hoechst Celanese Corporation - Somerville NJ
International Classification:

G03F 7023
US Classification:

430165
Abstract:

A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.

Resumes

Sales Executive

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Location:

New York, NY

Industry:

Banking

Work:

Investment Agent
Sales Executive
Commercial Bankimg 1987 - 1989
Vice President

Elementary School Counselo

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Work:

Victoria Independent School District
Elementary School Counselo

Dana Durham

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Dana Durham

About:

I'm a happy wife and mother to 6 amazing kids, aged 10 to 2. Five boys and one girl who keep me busier than I EVER thought possible!! This is a place where I can vent when needed but mostly share...

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The wearer of many hats: taxi driver, chef, organizer, cleaning lady, educator.......