Abani M Biswas

US Patent:

20070038973, Feb 15, 2007

Filed:

Oct 19, 2006

Appl. No.:

11/584737

Inventors:

Jianliang Li - Hillsboro OR, US
Qiliang Yan - Portland OR, US
Lawrence Melvin - Hillsboro OR, US
Levi Barnes - Hillsboro OR, US
Alakananda Biswas - Beaverton OR, US
Abani Biswas - Beaverton OR, US

International Classification:

G06F 17/50

US Classification:

716021000

Abstract:

One embodiment of the present invention determines the effect of placing an assist feature at a location in a layout. During operation, the system receives a first value which was pre-computed by convolving a model with a layout at an evaluation point, wherein the model models semiconductor manufacturing processes. Next, the system determines a second value by convolving the model with an assist feature, which is assumed to be located at a first location which is in proximity to the evaluation point. The system then determines the effect of placing an assist feature using the first value and the second value. An embodiment of the present invention can be used to determine a substantially optimal location for placing an assist feature in a layout.